Mechanical property changes in porous low-k dielectric thin films during processing
G. Stan; R. S. Gates; P. Kavuri; J. Torres; D. Michalak; C. Ege; J. Bielefeld; S. W. King
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Applied Physics Letters 105, 152906，第 152906-1–152906-3 页
Applied Physics Letters 105, 152906，第 152906-1–152906-4 页
Applied Physics Letters 105, 152906，第 152906-1、152906-3–152906-4 页
Applied Physics Letters 105, 152906，第 152906-2–152906-3 页
Applied Physics Letters 105, 152906，第 152906-2–152906-4 页
Applied Physics Letters 105, 152906，第 152906-3–152906-4 页